Chemistries available in QDB (32).
Chemistry sets in this section are self-consistent and their self-consistency is established using plasma modelling software.
The star ranking is reflecting the level of validation available for this chemistry set. It is based on four approaches:
More details about validation can be found here
|Rating||Description of comparison conditions|
|The chemistry is self-consistent but simulation results show different behaviour than the available experimental measurements.|
|The chemistry is self-consistent but has not yet been compared with experimental or theoretical data, contribution of the data for comparison is welcome.|
|The chemistry is self-consistent and compares well with measurements for the same process conditions: Power, Gas flow, Pressure. Your contribution of the validation data is welcome.|
|The chemistry is self-consistent and compares well with measurements for process condition variations. For example, validation for different pressure regimes or gas flow in the gas mixture. The chemistry is self-consistent and validated by comparison of results using more than one software model. For example, it was used in Q-P, ChemKin and Q-VT, and showed the same trends with parameter variation. Your contribution of the validation data is welcome.|
|The chemistry is self-consistent, has been validated by comparison of results using more than one software model, and reproduces the experimental data. For example, it was used in Q-P, ChemKin and Q-VT, showed the same trends with parameter variation and compared well with the experimental data. Your contribution of the validation data is welcome.|
|C29||SF$_6$ / CF$_4$/ O$_2$ chemistry||463|
|C35||C$_2$F$_6$ / SiO$_2$(s) plasma etch||9|
|C36||CF$_4$ / SiO$_2$(s)||66|